Computer Control Electron Beam Source

. Application: high quality optical film as glass, PC and
  wafer, etc.
. Feature: automatic coating process & pressure control,
  fast pumping rate, good film uniformity, automatic
  control and protection by PLC and computer
. Spec:
  1) Main power: 3 phase 220/380 v. 50/60 hz approx
     120 ~ 250 a　　
  2) Sus chamber: dia. 1,100/1,400 mm x h. 1,200/1,600 mm;
     (or customer spec)　　
  3) System control: computer PLC automatic control and
     protection
  4) Vacuum pumps:
     . Mechanic pump/4,500/8,500 l/min
     . Roos pump/1600/3400 m3/hr
     . Diffusion pump/23,000 l/sec/26 inch
     . customer spec　
. Thickness controller: optical or crystal　
. E-beam: 5 ~ 10 kw on 4 x 30 cc crucibles　　
. Necessary space weight (approx):　　
  W x D x H: 2,800 x 1,500 x 2,400 mm, 3,000 ~ 5,000
  kg　
. Optional: plasma ion source cleaning & assist
  coating　　
. Gas mass flow controller

1. Well and High Quality Control